Title :
Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist
Author :
Hirose, Ryo ; Kozawa, Takahiro ; Tagawa, Seiichi ; Kai, Toshiyuki ; Shimokawa, Tsutomu
Author_Institution :
Osaka Univ., Ibaraki
Abstract :
In this study, the number of acid molecules generated in a model system of chemically amplified EUV resist was evaluated using an acid sensitive dye. Also, the absorption coefficient is a critical factor for the resist design. A convenient method to estimate the absorption coefficient of resists was proposed.
Keywords :
absorption coefficients; dyes; photoresists; ultraviolet lithography; EUV resist; absorption coefficient; acid generation efficiency; acid generator concentration; acid sensitive dye; chemical amplification; Absorption; Chemical industry; Electronic mail; Electronics industry; Mass production; Optical films; Polymers; Protons; Resists; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456116
