Title :
A Study of Molecular Orientation Effect in Photoresist Films
Author :
Kaneyama, Koji ; Toriumi, Minoru ; Itani, Toshiro
Author_Institution :
Semicond. Leading Edge Technol., Inc., Ibaraki
Abstract :
In this paper, an investigation is made focusing on the molecular orientation in the resist film, the understanding and control of which will be very significant in the research and development of EUV resists. Molecular orientation can be investigated through fluorescence spectrometry. Based on the results, high viscosity resist solutions showed strong molecular orientation characteristics compared to that of the low viscosity resist solution given the same resist film thickness condition.
Keywords :
fluorescence; molecular orientation; organic compounds; photoresists; thin films; viscosity; EUV resists; fluorescence spectrometry; molecular orientation effect; photoresist films; pyrene; resist film thickness; viscosity resist solutions; Additives; Chemical technology; Fluorescence; Lead compounds; Research and development; Resists; Semiconductor films; Spectroscopy; Ultraviolet sources; Viscosity;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456118
