Guided formation of sub-10 nm silicide dot array and their morphology change by electron beam irradiation

We present a method for the formation of sub-10 nm scale silicide dots by applying e-beam energy. Our process demonstrates a hybrid approach which combines the "top down approach" -defining the area in which the dots are formed -and "bottom up approach" -which enables the formation of high density sub-10 nm scale dots below the resolution limit of e-beam patterning - in a single step process.