• DocumentCode
    3049291
  • Title

    Hierarchical defect tolerance technique for NRAM repairing with range matching CAM

  • Author

    Pourmeidani, Hossein ; Habibi, Mehdi

  • Author_Institution
    Comput. Eng. Dept., Azad Univ. of Arak, Arak, Iran
  • fYear
    2013
  • fDate
    14-16 May 2013
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Due to the small size of nanoscale devices, they are highly prone to process disturbances which results in manufacturing defects. Some of the defects are randomly distributed throughout the nanodevice layer. Other disturbances tend to be local and lead to cluster defects caused by factors such as layer misintegration and line width variations. In this paper, we propose a method for identifying cluster defects from random ones. The motivation is to repair the cluster defects using rectangular ranges in a range matching content-addressable memory (RM-CAM) and random defects using triple-modular redundancy (TMR). It is believed a combination of these two approaches is more effective for repairing defects at high error rate with less resource. With the proposed fault repairing technique, defect recovery results are examined for different fault distribution scenarios. Also the mapping circuit structure required for two conceptual 32×32 and 64×64 bit RAMs are presented and their speed, power and transistor count are reported.
  • Keywords
    content-addressable storage; integrated circuit reliability; nanoelectronics; random-access storage; redundancy; NRAM repairing; TMR; cluster defects; defect recovery; fault distribution; fault repairing technique; hierarchical defect tolerance technique; high error rate; layer misintegration; line width variations; manufacturing defects; mapping circuit structure; nanodevice layer; nanoscale devices; random defects; range matching CAM; range matching content-addressable memory; transistor count; triple-modular redundancy; Circuit faults; Computer aided manufacturing; Inverters; Random access memory; Read only memory; Redundancy; Tunneling magnetoresistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Engineering (ICEE), 2013 21st Iranian Conference on
  • Conference_Location
    Mashhad
  • Type

    conf

  • DOI
    10.1109/IranianCEE.2013.6599756
  • Filename
    6599756