• DocumentCode
    3049399
  • Title

    Focused electron beam induced etching and in-situ monitoring: Fabrication of sub-beam sized nanoholes

  • Author

    Miyazoe, H. ; Utke, I. ; Michler, J. ; Terashima, K.

  • Author_Institution
    EMPA - Mater. Sci. & Technol., Thun
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    254
  • Lastpage
    255
  • Abstract
    In this work, the control of focused ion beam induced deposition (FEBIE) process is examined through fabrication of nanoholes on 10-nm-thin amorphous carbon (a-C) membrane using H2O and XeF2 precursor, and its in-situ stage current measurement. Nanoholes with diameters smaller than the beam size were successfully obtained. Results indicate the feasibility of fabrication of nanoholes with sub-nm diameter in the future.
  • Keywords
    amorphous state; carbon; electron beam effects; focused ion beam technology; membranes; nanostructured materials; nanotechnology; sputter etching; C; amorphous carbon membrane; focused electron beam induced etching; stage current data; subbeam sized nanoholes; Biomembranes; Current measurement; Electron beams; Electron emission; Etching; Fabrication; Materials science and technology; Monitoring; Probes; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456200
  • Filename
    4456200
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3049399