A finite element mesh tailored to full NIL process modelling: hot embossing, cool-down and stamp release

This paper details the building of a finite element mesh tailored to the simulation of a complete nano-imprint lithography process. A novel approach to meshing of FE structures is devised, to address the issues specific to the NIL process: large aspect ratio and slip distance. It consists in generating a finely meshed structure as it should be after embossing and prior to releasing, and applying a geometric transformation to this structure so that it is "squeezed" back into the original flat geometry of the resist. Mesh created is not distorted or degenerate. The gain in terms of computing performance is roughly one order of magnitude, as the convergence speed is increased.