Imprinted 50 nm features by UV step and stamp imprint lithography method

In this paper, we report on fabrication of 50 nm features by using a UV step and stamp imprint lithography method (UV SSIL), which is based on thermal SSIL using a flip chip bonder. The idea is to fabricate nanoscale patterns by pressing a small stamp, also called mould or template, into a low viscosity monomer which is then polymerized and thereby hardened (cured) by UV exposure. The mirror replicaof the pattern of the stamp is copied in the polymer. The method is developed onto a stage where a dedicated tool (NPS300) is commercially available and easily configured for both techniques.