Evaluation of ultrathin films of polymeric resists for nanoimprint lithography

Author

Rymuza, Zygmunt ; Koszewski, Adam ; Ekwinska, Magdalena ; Nowek, Andrzej

Author_Institution

Warsaw Univ. of Technol., Warsaw

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

282

Lastpage

283

Abstract

This paper describes the techniques used to identify fundamental surface properties of ultrathin (200-300 nm) resist films devoted to be applied in nanoimprint lithography (NIL). The procedure is used both for unmodified and modified resist films to identify their crucial properties for NIL applications like surface free energy (adhesive-stiction properties), nanomechanical and nanotribological-nanorheological behaviors. The set of the tests on such materials consists of the three groups of the tests: atomic force microscopy (AFM) studies of the surface morphology (roughness), lateral (friction) and adhesion (pull-off force) of the film deposited on silicon substrate; wettability studies of the film and mechanical, tribological and adhesive tests versus temperature.

Keywords

adhesion; atomic force microscopy; free energy; friction; mechanical testing; polymer films; resists; rheology; surface energy; surface morphology; surface roughness; wetting; AFM; NIL; adhesive-stiction properties; atomic force microscopy; friction; lateral force; nanoimprint lithography; nanomechanical property; nanotribological-nanorheological property; pull-off force; silicon substrate; size 200 nm to 300 nm; surface free energy; surface morphology; surface roughness; ultrathin polymeric resist films; wettability; Atomic force microscopy; Atomic layer deposition; Materials testing; Nanolithography; Polymer films; Resists; Rough surfaces; Semiconductor films; Surface morphology; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456214

Filename

4456214