Title :
Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography
Author :
Hong, Sung-Hoon ; Hwang, Jae-Yeon ; Lee, Heon
Author_Institution :
Korea Univ., Seoul
Abstract :
Using hot embossing lithography, 8-inch sized sub-50 nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50 nm pattern was successfully fabricated on Si substrate.
Keywords :
nanolithography; polymers; soft lithography; ultraviolet lithography; Si; Si substrate; UV nanoimprint lithography; UV-NIL process; hot embossing lithography; polymer stamp fabrication; Coatings; Curing; Embossing; Fabrication; Lithography; Materials science and technology; Nanolithography; Polymer films; Substrates; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456216
