Title :
Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O2 Dry Etching Mask
Author :
Yasui, M. ; Sugiyama, Y. ; Takahashi, M. ; Kaneko, S. ; Uegaki, J. ; Hirabayashi, Y. ; Maeda, R.
Author_Institution :
Kanagawa Ind. Technol. Center, Kanagawa
Abstract :
In this article, the glassy carbon molds using hydrogen silsequioxane (HSQ) patterned by electron beam lithography (EBL) as O2 dry etching mask was fabricated. The use HSQ pattern written by EBL for O2 etching mask showed that the pattern is available for use in an etching mask to O2 plasma.
Keywords :
carbon; electron beam lithography; etching; glass; materials preparation; organic compounds; C; O2 dry etching mask; O2 plasma; electron beam lithography; glassy carbon mold fabrication; hydrogen silsequioxane pattern; Dry etching; Electron beams; Fabrication; Glass industry; Hydrogen; Lithography; Manufacturing industries; Microstructure; Organic materials; Plasma applications;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456218
