Title :
Effect of UV Irradiation on Organic-SOG Patterns Replicated by Room-Temperature Nanoimprinting
Author :
Nakamatsu, K. ; Takeuchi, Y. ; Taneichi, N. ; Matsui, S.
Author_Institution :
Hyogo Univ., Hyogo
Abstract :
Organic spin on glass(O-SOG) is very useful owing its unique property of enabling imprinting at room temperature as well as hydrogen silsesquioxane that we have used. This means that nanoimprinting using O-SOG as the replication material completely eliminates resist-thermal cycle and UV exposure. To avoid the pattern deformation, in this paper we investigate an effect of UV irradiation on the O-SOG-imprinted patterns before annealing.
Keywords :
annealing; deformation; nanolithography; organic compounds; ultraviolet radiation effects; UV irradiation; annealing; hydrogen silsesquioxane; organic spin on glass; pattern deformation; reflective index; resist-thermal cycle; room-temperature nanoimprinting; temperature 293 K to 298 K; Annealing; Glass; Lenses; Microoptics; Nanolithography; Optical arrays; Organic materials; Polymers; Resins; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456224
