Title :
Fabrication of photonic crystal-patterned light emitting diodes using nanoimprint lithography
Author :
Byeon, Kyeong-Jae ; Hwang, Seon-Yong ; Lee, Heon
Author_Institution :
Korea Univ., Seoul
Abstract :
This work reports on the economical and effective fabrication process of photonic crystal patterns on GaN-based light emitting diode (LED) structures using nanoimprint lithography (NIL) and inductively coupled plasma (ICP) etching process. Results reveal the capability of using NIL to fabricate sub-micron sized, photonic crystal patterns at reduced cost for high brightness LEDs.
Keywords :
III-V semiconductors; gallium compounds; light emitting diodes; nanolithography; nanopatterning; photonic crystals; plasma materials processing; sputter etching; GaN; high brightness LED; inductively coupled plasma etching; light emitting diodes; nanoimprint lithography; photonic crystal pattern fabrication; photonic crystal patterning; Chromium; Etching; Gallium nitride; Interference; Light emitting diodes; Lithography; Nanolithography; Optical device fabrication; Photonic crystals; Plasma applications;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456231
