DocumentCode
3049914
Title
Fabrication of photonic crystal-patterned light emitting diodes using nanoimprint lithography
Author
Byeon, Kyeong-Jae ; Hwang, Seon-Yong ; Lee, Heon
Author_Institution
Korea Univ., Seoul
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
316
Lastpage
317
Abstract
This work reports on the economical and effective fabrication process of photonic crystal patterns on GaN-based light emitting diode (LED) structures using nanoimprint lithography (NIL) and inductively coupled plasma (ICP) etching process. Results reveal the capability of using NIL to fabricate sub-micron sized, photonic crystal patterns at reduced cost for high brightness LEDs.
Keywords
III-V semiconductors; gallium compounds; light emitting diodes; nanolithography; nanopatterning; photonic crystals; plasma materials processing; sputter etching; GaN; high brightness LED; inductively coupled plasma etching; light emitting diodes; nanoimprint lithography; photonic crystal pattern fabrication; photonic crystal patterning; Chromium; Etching; Gallium nitride; Interference; Light emitting diodes; Lithography; Nanolithography; Optical device fabrication; Photonic crystals; Plasma applications;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456231
Filename
4456231
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