DocumentCode :
3049936
Title :
Study of process time on polymer characteristics in thermal NIL
Author :
Shibata, M. ; Tanabe, T. ; Kawata, H. ; Hirai, Y.
Author_Institution :
Osaka Pref. Univ., Osaka
fYear :
2007
fDate :
5-8 Nov. 2007
Firstpage :
320
Lastpage :
321
Abstract :
The aim of the paper is to study the dependence of the process time on the resist properties in experimentally and predict required process time for various molecular weights in PMMA. The deformation process time in thermal NIL is predicted based on experimental study in PMMA for various molecular weights and process temperature based on experimental study. These results are extraordinary useful in designing process conditions and polymer properties for rapid thermal NIL.
Keywords :
deformation; nanolithography; polymer solutions; soft lithography; viscosity; PMMA; deformation; molecular weights; polymer properties; rapid thermal NIL; resist; viscosity; Filling; Physics; Polymers; Process design; Rapid thermal processing; Resists; Temperature; Time measurement; Viscosity; deformation time; polymer; thermal nanoimprint; viscosity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
Type :
conf
DOI :
10.1109/IMNC.2007.4456233
Filename :
4456233
Link To Document :
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