• DocumentCode
    3049955
  • Title

    Molecular Dynamics Study of Nanoimprint Lithography for Glass Material

  • Author

    Tada, K. ; Kimoto, Y. ; Yasuda, M. ; Horimoto, S. ; Kawata, H. ; Hirai, Y.

  • Author_Institution
    Osaka Prefecture Univ., Osaka
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    322
  • Lastpage
    323
  • Abstract
    MD simulation of the glass forming process with NIL is performed to elucidate the deformation mechanismof the glass material during NIL. The atomic and molecular behavior and interaction, such as viscous flow of the glass and adhesion between the mold and glass, are taken into account. The transition of the applied stress to the mold during mold press, rest and release are comprehensively examined. Such knowledges are beyond the conventional continuum mechanics approach.
  • Keywords
    deformation; glass; molecular dynamics method; nanolithography; MD simulation; SiO2; deformation; glass forming process; glass material; mold press; viscous flow; Adhesives; Crystalline materials; Glass; Nanolithography; Nanoscale devices; Nanostructured materials; Optical device fabrication; Optical materials; Polymers; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456234
  • Filename
    4456234