DocumentCode
3049955
Title
Molecular Dynamics Study of Nanoimprint Lithography for Glass Material
Author
Tada, K. ; Kimoto, Y. ; Yasuda, M. ; Horimoto, S. ; Kawata, H. ; Hirai, Y.
Author_Institution
Osaka Prefecture Univ., Osaka
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
322
Lastpage
323
Abstract
MD simulation of the glass forming process with NIL is performed to elucidate the deformation mechanismof the glass material during NIL. The atomic and molecular behavior and interaction, such as viscous flow of the glass and adhesion between the mold and glass, are taken into account. The transition of the applied stress to the mold during mold press, rest and release are comprehensively examined. Such knowledges are beyond the conventional continuum mechanics approach.
Keywords
deformation; glass; molecular dynamics method; nanolithography; MD simulation; SiO2; deformation; glass forming process; glass material; mold press; viscous flow; Adhesives; Crystalline materials; Glass; Nanolithography; Nanoscale devices; Nanostructured materials; Optical device fabrication; Optical materials; Polymers; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456234
Filename
4456234
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