Title :
Molecular Dynamics Study of Nanoimprint Lithography for Glass Material
Author :
Tada, K. ; Kimoto, Y. ; Yasuda, M. ; Horimoto, S. ; Kawata, H. ; Hirai, Y.
Author_Institution :
Osaka Prefecture Univ., Osaka
Abstract :
MD simulation of the glass forming process with NIL is performed to elucidate the deformation mechanismof the glass material during NIL. The atomic and molecular behavior and interaction, such as viscous flow of the glass and adhesion between the mold and glass, are taken into account. The transition of the applied stress to the mold during mold press, rest and release are comprehensively examined. Such knowledges are beyond the conventional continuum mechanics approach.
Keywords :
deformation; glass; molecular dynamics method; nanolithography; MD simulation; SiO2; deformation; glass forming process; glass material; mold press; viscous flow; Adhesives; Crystalline materials; Glass; Nanolithography; Nanoscale devices; Nanostructured materials; Optical device fabrication; Optical materials; Polymers; Stress;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456234