Title :
EUV lithography using the small field exposure tool: recent status
Author :
Tawarayama, Kazuo ; Magoshi, Shunko ; Tanaka, Yuusuke ; Shirai, Seiichiro ; Tanaka, Hiroyuki
Author_Institution :
Semiconductor Leading Edge Technol. Inc., Ibaraki
Abstract :
The tool performance of the SFET was effectively demonstrated with the resolution of 45-nm, 32-nm and 26-nm half-pitch lines and spaces patterns. These initial results will provide the basis for the continuous and fast-paced development of EUV lithography in Selete.
Keywords :
ultraviolet lithography; EUV lithography; Selete´s small field exposure tool; semiconductor design; Chemicals; Lead compounds; Lighting; Lithography; Manufacturing; Plasma materials processing; Plasma sources; Resists; Stimulated emission; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456272
