• DocumentCode
    3050627
  • Title

    Resolution enhancement of EUV microscope using an EUV beam splitter

  • Author

    Osugi, Masafumi ; Tanaka, Kazuumi ; Sakaya, Noriyuki ; Hamamoto, Kazuhiro ; Watanabe, Takeo ; Kinoshita, Hiroo

  • Author_Institution
    Univ. of Hyogo, Hyogo
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    400
  • Lastpage
    401
  • Abstract
    Extreme ultraviolet lithography (EUVL) has been proposed as a next generation lithography. In this paper, EUV phase-shift microscope was developed to detect phase defect in multilayer mask and EUV beam splitter is also developed, which is critical component of phase-shift inspection or resolution enhancement.
  • Keywords
    optical beam splitters; optical microscopy; optical multilayers; optical phase shifters; ultraviolet lithography; EUV beam splitter; EUV phase-shift microscope; extreme ultraviolet lithography; multilayer mask; phase defect; phase-shift inspection; resolution enhancement; Inspection; Lithography; Microscopy; Mirrors; Nonhomogeneous media; Optical beam splitting; Optical beams; Optical films; Optical interferometry; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456273
  • Filename
    4456273
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3050627