Title :
Resolution enhancement of EUV microscope using an EUV beam splitter
Author :
Osugi, Masafumi ; Tanaka, Kazuumi ; Sakaya, Noriyuki ; Hamamoto, Kazuhiro ; Watanabe, Takeo ; Kinoshita, Hiroo
Author_Institution :
Univ. of Hyogo, Hyogo
Abstract :
Extreme ultraviolet lithography (EUVL) has been proposed as a next generation lithography. In this paper, EUV phase-shift microscope was developed to detect phase defect in multilayer mask and EUV beam splitter is also developed, which is critical component of phase-shift inspection or resolution enhancement.
Keywords :
optical beam splitters; optical microscopy; optical multilayers; optical phase shifters; ultraviolet lithography; EUV beam splitter; EUV phase-shift microscope; extreme ultraviolet lithography; multilayer mask; phase defect; phase-shift inspection; resolution enhancement; Inspection; Lithography; Microscopy; Mirrors; Nonhomogeneous media; Optical beam splitting; Optical beams; Optical films; Optical interferometry; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456273
