The IMPRINT software: quantitative predictions of the residual resist thickness in nanoimprint

Author

Kehagias, Nikolaos ; Reboud, V. ; Torres, C. M. Sotomayor ; Sirotkin, Vadim ; Svintsov, Alexander ; Zaitsev, Sergey

Author_Institution

Univ. Coll. Cork, Cork

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

404

Lastpage

405

Abstract

With the aim of optimizing the stamp geometry, a refined model for simultaneous calculation of the resist viscous flow in nanoimprint lithography (NIL) and the stamp/substrate deformation has been introduced. This model has been realized in the IMPRINT software. The software is designed for use on standard personal computers and provides results well suited for quantitative predictions of the residual resist thickness in NIL. A very good agreement between simulation and experimental results has been obtained. The results confirm the potential of the IMPRINT software as an efficient tool for the reduction of the stamp bending.

Keywords

bending; nanolithography; resists; soft lithography; viscosity; IMPRINT software; nanoimprint lithography; residual resist thickness; resist viscous flow; stamp bending; stamp geometry; stamp-substrate deformation; Computational modeling; Deformable models; Geometry; Microcomputers; Nanolithography; Resists; Software design; Software standards; Software tools; Solid modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456275

Filename

4456275