Title :
Optimal resist dispensing in step and flash NIL
Author :
Sirotkin, Vadim ; Svintsov, Alexander ; Zaitsev, Sergey
Author_Institution :
RAS, Moscow
Abstract :
Development of algorithm for drop dispensing optimization in ultraviolet nanoimprint lithography (UV-NIL) considering optimal filling of a stamp is reported.
Keywords :
nanolithography; optimisation; ultraviolet lithography; drop dispensing optimization; nanoimprint lithography; ultraviolet lithography; Chemical technology; Control system synthesis; Filling; Geometry; Microelectronics; Nanolithography; Resists; Standards development; Testing; Thermal resistance;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456276
