3D nanofabrication by reverse contact UV nanoimprint lithography

A newly developed nanofabrication technique, namely reverse contact UV nanoimprint lithography, which is a combination of nanoimprint lithography and contact printing lithography is carried out to fabricate the multilayered polymer structures with sub-micrometer features. This method results in resist pattern transfer without a residual layer thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional (3D) patterning.