DocumentCode
3050730
Title
High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics
Author
Pease, R. Fabian ; Pickard, Daniel S. ; Tanimoto, Sayaka
Author_Institution
Stanford Univ., Stanford
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
414
Lastpage
415
Abstract
In this paper, distributed-axis technology is applied to high-speed scanning electron microscopy for large scale inspection and metrology of nanostructures. Simulated results indicate that each aperture in the retarding electrode must be kept to less than 0.1mm diameter to avoid extra aberrations and that extra slots be provided to accommodate the spread in the trajectories of the secondary electrons with different energies (up to 10eV)4. Experimental verification of these simulated results is underway.
Keywords
electron optics; inspection; nanotechnology; scanning electron microscopy; distributed axis electron optics; high speed scanning electron microscopy; large scale inspection; metrology; nanostructures; secondary electrons; Acceleration; Apertures; Detectors; Electron beams; Electron optics; Inspection; Lithography; Optical microscopy; Scanning electron microscopy; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456280
Filename
4456280
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