• DocumentCode
    3050730
  • Title

    High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics

  • Author

    Pease, R. Fabian ; Pickard, Daniel S. ; Tanimoto, Sayaka

  • Author_Institution
    Stanford Univ., Stanford
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    414
  • Lastpage
    415
  • Abstract
    In this paper, distributed-axis technology is applied to high-speed scanning electron microscopy for large scale inspection and metrology of nanostructures. Simulated results indicate that each aperture in the retarding electrode must be kept to less than 0.1mm diameter to avoid extra aberrations and that extra slots be provided to accommodate the spread in the trajectories of the secondary electrons with different energies (up to 10eV)4. Experimental verification of these simulated results is underway.
  • Keywords
    electron optics; inspection; nanotechnology; scanning electron microscopy; distributed axis electron optics; high speed scanning electron microscopy; large scale inspection; metrology; nanostructures; secondary electrons; Acceleration; Apertures; Detectors; Electron beams; Electron optics; Inspection; Lithography; Optical microscopy; Scanning electron microscopy; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456280
  • Filename
    4456280