Title :
Succeeding Optical Lithography with Multiple E-Beam Direct Write
Author_Institution :
TSMC Ltd., Hsinchu
Abstract :
This article presents a general review of e-beam lithography as a successor for optical lithography. However, there is no way for e-beam lithography to meet the throughput and resolution target obtained in optical lithography, unless drastically new ideas are implemented to increase parallelism, reduce space charge, and control cost. This article explores these fields briefly.
Keywords :
electron beam lithography; nanolithography; photolithography; control cost; e-beam lithography; multiple e-beam direct write; optical lithography; parallelism; space charge; Apertures; Costs; High speed optical techniques; Lenses; Lithography; Optical refraction; Optical variables control; Printing; Throughput; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456281
