Electrical and structural studies of plasma-polymerized fluorocarbon films

Author

Amyot, N. ; Wertheimer, M.R. ; Ségui, Y. ; Moisan, M.

Author_Institution

Dept. of Eng. Phys., Ecole Polytech., Montreal, Que., Canada

fYear

1990

fDate

28-31 Oct 1990

Firstpage

208

Lastpage

218

Abstract

A series of PPFC (plasma-polymerized fluorocarbon) film materials having widely varying compositions and properties was studied. Fluorine-rich (Teflon-like) films (F/C≳1.7) were found to have relatively low degrees of oxidation, as manifested by their infrared and XPS spectra. Strong correlations between film compositions and their electrical properties were found. The TSD spectra of PPFC films are reported: the α and β relaxations observed near 50°C and -80°C, respectively, correlate well with dielectric relaxations corresponding to carbonyl dipoles and to local motions of fluorocarbon chain segments observed by other workers. The charge storage time constants shows rough correlation with F/ C; the large scatter of data, however, suggests that this relationship should be the object of further studies

Keywords

X-ray photoelectron spectra; dielectric relaxation; infrared spectra of organic molecules and substances; organic insulating materials; polymer films; thermally stimulated currents; α relaxations; β relaxations; -80 C; 50 C; IR spectra; PPFC films; TSD spectra; XPS spectra; charge storage time constants; dielectric relaxations; electrical properties; film compositions; fluorine/carbon ratio; plasma-polymerized fluorocarbon films; scatter of data; structural properties; Electrets; Fabrication; Material storage; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature; Plasma waves; Polymer films;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Insulation and Dielectric Phenomena, 1990. Annual Report., Conference on

Conference_Location

Pocono Manor, PA

Type

conf

DOI

10.1109/CEIDP.1990.201344

Filename

201344