Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

Numerical and experimental analyses of an intermittent line-and-space pattern in thermal nanoimprint lithography were carried out. Both numerical and experimental results showed same tendencies and explained characteristic phenomena which never appear in continuous line-and-space patterning cases. We believe that numerical simulations with more accurate material properties and finer finite element meshes have possibilities to agree with experiments better enough for practical use.