• DocumentCode
    3051507
  • Title

    Analysis of Flow Rate through Channel in New Design of Active Fountain Pen Nanolithography

  • Author

    Shin, C. ; Hwang, K. ; Kim, Y. ; Kim, H.

  • Author_Institution
    Sungkyunkwan Univ., Suwon
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    502
  • Lastpage
    503
  • Abstract
    In this paper, new design AFPN (active fountain pen nanolithography) uses open and close control. Reservoir upper tip is designed. We analyze load of flux and atmospheric pressure from opened part of reservoir. When tip is contacted on surface, flux is outpoured by tip´s repulsive force. We present analysis that control flux according to force that gives pressure to tip.
  • Keywords
    channel flow; nanolithography; active fountain pen nanolithography; atmospheric pressure; channel flow rate; Bonding; Equations; Fabrication; Force control; Nanolithography; Pressure control; Reservoirs; Size control; Stationary state; Velocity control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456324
  • Filename
    4456324
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3051507