Title :
Analysis of Flow Rate through Channel in New Design of Active Fountain Pen Nanolithography
Author :
Shin, C. ; Hwang, K. ; Kim, Y. ; Kim, H.
Author_Institution :
Sungkyunkwan Univ., Suwon
Abstract :
In this paper, new design AFPN (active fountain pen nanolithography) uses open and close control. Reservoir upper tip is designed. We analyze load of flux and atmospheric pressure from opened part of reservoir. When tip is contacted on surface, flux is outpoured by tip´s repulsive force. We present analysis that control flux according to force that gives pressure to tip.
Keywords :
channel flow; nanolithography; active fountain pen nanolithography; atmospheric pressure; channel flow rate; Bonding; Equations; Fabrication; Force control; Nanolithography; Pressure control; Reservoirs; Size control; Stationary state; Velocity control;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456324
