DocumentCode :
3051748
Title :
Fabrication of volcano-structured double-gate FEAs by etch-back technique
Author :
Soda, T. ; Nagao, M. ; Yasumuro, C. ; Kanemaru, S. ; Sakai, T. ; Saito, N. ; Neo, Y. ; Aoki, T. ; Mimura, H.
Author_Institution :
Shizuoka Univ., Hamamatsu
fYear :
2007
fDate :
5-8 Nov. 2007
Firstpage :
526
Lastpage :
527
Abstract :
Volcano-structured double-gate field emission display (VDG-FEA) is fabricated by etch-back technique. Electron trajectories from VDG-FEA are roughly calculated using charged particle trajectories simulation program SIMION.
Keywords :
etching; field emission displays; SIMION program; VDG-FEA; charged particle trajectories simulation; electron trajectories; etch-back technique; volcano-structured double-gate field emission display; Current density; Degradation; Electrodes; Electron beams; Etching; Fabrication; Flat panel displays; Focusing; Hafnium; Niobium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
Type :
conf
DOI :
10.1109/IMNC.2007.4456336
Filename :
4456336
Link To Document :
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