• DocumentCode
    3051771
  • Title

    Evaluation method of Optical Index of Ta and Ta-based absorber for EUV mask Using Extreme Ultraviolet Reflectometer

  • Author

    Hosoya, Morio ; Sakaya, Noriyuki ; Nozawa, Osamu ; Hamamoto, Kazuo ; Nagarekawa, Osamu ; Watanabe, Takeo ; Kinoshita, Hiroo

  • Author_Institution
    R&D Center, Tokyo
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    528
  • Lastpage
    529
  • Abstract
    This study investigates accurate methods to obtain optical index of tantalum (Ta) and Ta-based absorber added nitrogen (N), oxygen (O) and boron (B) for an EUV finished mask. To obtain optical index, Ta derived by atomic concentration of composite materials and density of the thin layer estimation is a significant issue.
  • Keywords
    extinction coefficients; refractive index; tantalum; EUV mask; Ta; absorber; extinction coefficient; extreme ultraviolet reflectometer; optical index; refractive index; Atom optics; Atomic layer deposition; Atomic measurements; Optical films; Optical scattering; Optical surface waves; Oxidation; Reflectivity; Ultraviolet sources; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456337
  • Filename
    4456337
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3051771