Title :
Evaluation method of Optical Index of Ta and Ta-based absorber for EUV mask Using Extreme Ultraviolet Reflectometer
Author :
Hosoya, Morio ; Sakaya, Noriyuki ; Nozawa, Osamu ; Hamamoto, Kazuo ; Nagarekawa, Osamu ; Watanabe, Takeo ; Kinoshita, Hiroo
Author_Institution :
R&D Center, Tokyo
Abstract :
This study investigates accurate methods to obtain optical index of tantalum (Ta) and Ta-based absorber added nitrogen (N), oxygen (O) and boron (B) for an EUV finished mask. To obtain optical index, Ta derived by atomic concentration of composite materials and density of the thin layer estimation is a significant issue.
Keywords :
extinction coefficients; refractive index; tantalum; EUV mask; Ta; absorber; extinction coefficient; extreme ultraviolet reflectometer; optical index; refractive index; Atom optics; Atomic layer deposition; Atomic measurements; Optical films; Optical scattering; Optical surface waves; Oxidation; Reflectivity; Ultraviolet sources; Wavelength measurement;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456337
