DocumentCode :
3051835
Title :
High pressure solution growth and physical properties of GaN crystals
Author :
Grzegory, I.
Author_Institution :
High Pressure Res. Center, Polish Acad. of Sci., Warsaw, Poland
fYear :
1998
fDate :
1998
Firstpage :
3
Lastpage :
10
Abstract :
The recent results in high pressure crystallization of GaN from the solutions of N in pure Ga and in its alloys with II group metals (Mg, Ca, Zn) are discussed. It is shown that high resistivity (104 -106 Ωcm) GaN crystals of improved structural quality can be grown from solutions containing Mg. The structural, electrical and optical properties properties of GaN crystals grown without and with the intentional doping are compared. It is also shown that atomically flat, thermally stable surfaces of GaN substrates can be obtained by mechanical and mechano-chemical polishing. Some most interesting results concerning homoepitaxial growth by MOCVD and MBE are reviewed
Keywords :
III-V semiconductors; chemical mechanical polishing; crystal growth from solution; electrical resistivity; gallium compounds; high-pressure effects; hopping conduction; infrared spectra; polishing; semiconductor growth; visible spectra; GaN; GaN crystals; GaN substrates; MBE; MOCVD; electrical properties; high pressure crystallization; high pressure solution growth; high resistivity; homoepitaxial growth; intentional doping; mechanical polishing; mechano-chemical polishing; optical properties; physical properties; structural quality; thermally stable surfaces; Bonding; Crystallization; Crystals; Furnaces; Gallium alloys; Gallium nitride; Substrates; Temperature distribution; Temperature measurement; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
Type :
conf
DOI :
10.1109/SIM.1998.785065
Filename :
785065
Link To Document :
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