• DocumentCode
    3051860
  • Title

    Observation of Size Dependent Structural Defects in Silicon Nanowires

  • Author

    Akhtar, Saeed ; Usami, K. ; Tsuchiya, Y. ; Mizuta, H. ; Oda, S.

  • Author_Institution
    Tokyo Inst. of Technol., Tokyo
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    536
  • Lastpage
    537
  • Abstract
    Summary form only given. The controlled synthesis of defect-free Si nanowires with small diameters is a prerequisite to realize Si nanowire based electronics and photonics devices. The crystallinity of vapor-liquid-solid (VLS) grown nanowires can be very good and some times termed as defect-free. Here, the authors report the size dependent defects in Si nanowires grown epitaxially in <111> as a preferred direction. Si nanowires with small diameter were found defect-free while nanowires with large diameters have large number of multiple twin defects. Such defects can deteriorate the performance of optoelectronic nanowire devices. These investigations provide deep understanding about defect formation mechanism and strategies to control the crystallinity of Si nanowires grown by VLS-technique. Si nanowires with diameters 12 plusmn 5 nm and 20 plusmn 5 nm were grown from Au droplets 9 plusmn 5 nm and 12 plusmn 5 nm respectively prepared on H-terminated Si(lll) with resistivity 1-1.2 Omega cm. The high density growth of Si nanowires was carried out in low pressure chemical vapor deposition (LPCVD) chamber by typically exposing the substrates covered by Au droplets to 1 sccm of Si2H6 and 49 sccm of H2 at a pressure of 3 Torr at 350degC. Scanning electron microscopy (SEM) and tunneling electron microscopy (TEM) has been employed to analyze the samples. TEM image and Fast Fourier Transform revealed that <111> is predominant growth direction of SiNWs synthesized by VLS-mechanism. Si nanowires with large diameters about 20 nm have multiple twin defects that cut across the nanowires in exactly perpendicular to the growth direction. These twin defects extending down the entire length of the nanowires induce micro-faceting or zig-zag appearance of the nanowire surface. It clearly reveals that these defects are twins and not dislocations or crystal imperfections. Si nanowires with diameter about 10 nm and 6 nm respectively are defe- ct-free and have single crystal core. We have shown that twining in Si nanowires is size-dependent. Nanowires with small diameters grown at low temperature are defect-free and suitable for electronics and optical applications. It shows that low temperature growth process is essential to fabricate high crystal quality Si nanowires with small diameters.
  • Keywords
    chemical vapour deposition; elemental semiconductors; epitaxial growth; nanowires; scanning electron microscopy; semiconductor growth; semiconductor quantum wires; silicon; transmission electron microscopy; twin boundaries; Au; LPCVD; SEM; Si; TEM; defect formation mechanism; defect-free silicon nanowires; epitaxial growth; fast Fourier transform; low pressure chemical vapor deposition; multiple twin defects; pressure 3 torr; scanning electron microscopy; size dependent structural defects; temperature 350 degC; tunneling electron microscopy; twins; vapor-liquid-solid grown nanowires; Conductivity; Crystallization; Gold; Nanowires; Optical control; Photonic crystals; Scanning electron microscopy; Silicon; Temperature; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456341
  • Filename
    4456341