DocumentCode :
3052274
Title :
Influence of growth conditions on the As antisites, AsGa 0 and AsGa+ concentrations in the low temperature GaAs MBE growth: A first theoretical study
Author :
Krishnan, Natarajan ; Venkat, Rama ; Dorsey, Donald L.
Author_Institution :
Dept. of Electr. & Comput. Eng., Nevada Univ., Las Vegas, NV, USA
fYear :
1998
fDate :
1998
Firstpage :
109
Lastpage :
112
Abstract :
A novel theoretical investigation is employed to study the influence of surface dynamics in low temperature MBE growth of GaAs. A kinetic growth model along with the charge neutrality equation is used to find the distribution of As antisites between the neutral and charged species using the bulk Ga vacancy concentrations obtained from simulations for the first time. The experimentally observed temperature and as flux dependencies of the As antisite concentrations are successfully reproduced by the model. The AsGa0 and AsGa+ concentrations saturate with As flux for a given temperature due to saturation of an amorphous, physisorbed As surface layer which acts as the reservoir for As antisite incorporation. The As antisite concentration saturates at lower value for higher temperature due to larger evaporation of As antisite from the crystalline state. It is observed that both AsGa0 and AsGa+ concentrations decrease with increase in temperature. While the decrease of AsGa0 concentration with temperature is related to the direct evaporation of As antisite from the crystalline state, the decrease of Asga + is related to a decrease in the Ga vacancy concentration
Keywords :
III-V semiconductors; antisite defects; gallium arsenide; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; semiconductor process modelling; surface dynamics; vacancies (crystal); As antisite; As antisite concentration; As antisites; Ga vacancy concentration; GaAs; amorphous physisorbed As surface layer; bulk Ga vacancy concentrations; charge neutrality equation; charged species; growth conditions; kinetic growth model; low temperature GaAs MBE growth; neutral species; surface dynamics; Atomic layer deposition; Atomic measurements; Computer aided manufacturing; Crystallization; Equations; Frequency; Gallium arsenide; Kinetic theory; Laboratories; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
Type :
conf
DOI :
10.1109/SIM.1998.785087
Filename :
785087
Link To Document :
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