Title :
Stoichiometry-dependent vacancy formation in n-doped GaAs
Author :
Gebauer, J. ; Lausmann, M. ; Krause-Rehberg, R.
Author_Institution :
Fachbereich Phys., Martin-Luther-Univ., Halle-Wittenberg, Germany
Abstract :
The formation of vacancies in n-doped GaAs with variable stoichiometry was studied by means of positron annihilation. Highly Te-doped (n=1.5-5×1018 cm-3) GaAs samples were annealed at high temperatures under variable arsenic vapor pressure (pAs) and rapidly quenched to room temperature. We found that monovacancies exist in Te-doped GaAs regardless of the annealing conditions. In contrast, the vacancy concentration was found to be dependent on pAs, i.e. on the stoichiometry. The vacancy concentration increases like pAs1/4 and saturates at high As pressures (3-6 bar). This is a proof that the dominant vacancies in Te-doped As-rich GaAs are related to Ga vacancies, in agreement to theoretical results. Moreover, the vacancies were independently identified by using the Doppler broadening coincidence technique
Keywords :
Doppler broadening; III-V semiconductors; annealing; gallium arsenide; heavily doped semiconductors; positron annihilation; quenching (thermal); stoichiometry; tellurium; vacancies (crystal); 20 C; Doppler broadening coincidence technique; Ga vacancies; GaAs:Te; Te-doped GaAs; arsenic vapor pressure; highly Te-doped GaAs samples; monovacancies; n-doped GaAs; positron annihilation; rapid quenching; room temperature; stoichiometry; stoichiometry-dependent vacancy formation; vacancies; vacancy concentration; Annealing; Charge carrier density; Crystals; Furnaces; Gallium arsenide; Microscopy; Positrons; Pressure measurement; Temperature measurement; Thermodynamics;
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
DOI :
10.1109/SIM.1998.785093