DocumentCode :
3052460
Title :
Small angle scattering experiments on annealed gallium arsenide single crystal wafers
Author :
Herms, M. ; Goperigk, G. ; Klemm, V. ; Meier, G. ; Zychowitz, G.
Author_Institution :
Dept. of Electron. & Inf. Sci., Kyoto Inst. of Technol., Japan
fYear :
1998
fDate :
1998
Firstpage :
157
Lastpage :
160
Abstract :
The minimum concentration of excess atoms precipitated in GaAs and InP being necessary to cause observable small angle scattering of X-rays and neutrons (SAXS and SANS, respectively) was estimated. Consequently, undoped melt-grown GaAs wafers were annealed at high arsenic pressure. Areas of a strongly increased density of precipitate were localized by transmission electron microscopy. SAXS experiments have revealed a very weak intensity being dependent on energy at values of the scattering vector Q>0.02 Å-1. Different annealing procedures have resulted in distinguishable curves of SANS (Q<0.03 Å-1) in dependence on temperature and arsenic pressure
Keywords :
III-V semiconductors; X-ray scattering; annealing; gallium arsenide; neutron diffraction; precipitation; transmission electron microscopy; SANS; SAXS; SiC; annealed gallium arsenide single crystal wafers; annealing procedures; arsenic pressure; high arsenic pressure; precipitate; small angle X-ray scattering; small angle neutron scattering; small angle scattering experiments; transmission electron microscopy; undoped melt-grown GaAs wafers; Annealing; Crystals; Electromagnetic wave absorption; Electrons; Gallium arsenide; Neutrons; Particle scattering; Polymers; Storage area networks; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
Type :
conf
DOI :
10.1109/SIM.1998.785098
Filename :
785098
Link To Document :
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