Interdigitated metal-semiconductor-metal (MSM) structures-rigorous treatment of light propagation

Author

Korner, T.O. ; Regli, P. ; Krumbein, Ulrich ; Fichtner, W.

Author_Institution

Integrated Syst. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland

Volume

1

fYear

1996

fDate

18-21 Nov. 1996

Firstpage

186

Abstract

Light propagation in a periodic interdigitated metal-semiconductor-metal (MSM) structure is modelled by means of rigorous electromagnetic theory. The effects of varying the intensity distribution on the time dependence of the response behaviour are examined using electronic device simulation.

Keywords

digital simulation; electromagnetic theory of light; electromagnetic wave propagation; high-speed optical techniques; light propagation; metal-semiconductor-metal structures; optical signal detection; semiconductor device models; electrical pulses; electronic device simulation; intensity distribution; interdigitated MSM structures; interdigitated metal-semiconductor-metal structures; light propagation; periodic interdigitated MSM structure; response behaviour; rigorous electromagnetic theory; time dependence; ultrashort optical pulse detection; ultrashort optical pulse generation; Charge carrier processes; Circuit simulation; Detectors; Electromagnetic modeling; Electromagnetic propagation; Equations; Gratings; Optical propagation; Optical pulse generation; Periodic structures;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE

Conference_Location

Boston, MA, USA

Print_ISBN

0-7803-3160-5

Type

conf

DOI

10.1109/LEOS.1996.565187

Filename

565187