DocumentCode :
305271
Title :
Application of near-field optics to critical dimension metrology
Author :
Bukofsky, Scott ; Selberg, Scott ; Grober, Robert
Author_Institution :
Dept. of Appl. Phys., Yale Univ., New Haven, CT, USA
Volume :
1
fYear :
1996
fDate :
18-21 Nov. 1996
Firstpage :
247
Abstract :
During the manufacture of microelectronic devices and circuits, it is necessary to accurately measure the sizes of the features being patterned. For measurement of extremely small features (<0.25 /spl mu/m), scanned probe microscopes are commonly used, but these techniques are typically quite poor at measuring absolute length scales. The reason for this is the extreme nonlinearity of the piezoelectric element used to provide the fine motion of the probe. We have designed and built a near-field scanning optical microscope that corrects for these problems. This technique takes advantage of the fact that the probe is emitting light, by imaging the aperture on a position-sensitive photodetector. This technology is enabled by the recent invention of all-electrical force feedback using an oscillating quartz tuning fork. This allows the design of a tip-scanning microscope as opposed to a sample-scanner. The optical probe is a length of metallized single mode optical fiber, whose end has been tapered to form a small point. The probe is positioned by a piezoelectric tube, which can provide motion in three dimensions.
Keywords :
integrated circuit measurement; optical fibres; optical microscopy; scanning probe microscopy; size measurement; 0.25 mum; all-electrical force feedback; critical dimension metrology; extremely small features; feature size measurement; light emitting probe; metallized single mode optical fiber; microelectronic manufacture; near-field scanning optical microscope; optical fiber tapering; oscillating quartz tuning fork; piezoelectric element nonlinearity; piezoelectric tube; position-sensitive photodetector; probe positioning; three dimensional motion; tip-scanning microscope; Circuits; Length measurement; Manufacturing; Metrology; Microelectronics; Optical feedback; Optical microscopy; Probes; Stimulated emission; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-3160-5
Type :
conf
DOI :
10.1109/LEOS.1996.565221
Filename :
565221
Link To Document :
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