DocumentCode :
305306
Title :
Application of EBIC and voltage contrast techniques to the study of current blocking in buried heterostructure lasers
Author :
Flynn, E.J. ; Angst, D.L. ; Thomas, P.M.
Author_Institution :
Lucent Technol., Breingsville, PA, USA
Volume :
1
fYear :
1996
fDate :
18-21 Nov. 1996
Firstpage :
316
Abstract :
Summary form only given. Real-index guided semiconductor lasers with their active layers buried in lower-index material require careful design and fabrication to achieve high-injection efficiencies in these devices. A design god of primary importance is that of zero leakage current. Leakage currents can involve the current-blocking layers, the heterostructure itself or both. In this presentation we discuss the great utility of techniques available on the scanning electron microscope (SEM) as feedback tools in the development of lasers with highly effective blocking of leakage currents. A diagram of the InGaAsP-InP capped mesa buried heterostructure (CMBH) laser is shown to consist of an etched mesa that includes the active layer.
Keywords :
EBIC; III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; leakage currents; optical design techniques; optical testing; refractive index; scanning electron microscopy; semiconductor device testing; semiconductor lasers; EBIC; InGaAsP-InP; InGaAsP-InP capped mesa buried heterostructure laser; active layer; active layers; buried heterostructure lasers; current blocking; current-blocking layers; etched mesa; high-injection efficiencies; highly effective blocking; laser testing; leakage currents; lower-index material; optical testing; real-index guided semiconductor lasers; scanning electron microscope; voltage contrast techniques; zero leakage current; Etching; Laser feedback; Leakage current; Optical design; Optical device fabrication; Optical materials; Scanning electron microscopy; Semiconductor lasers; Semiconductor materials; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-3160-5
Type :
conf
DOI :
10.1109/LEOS.1996.565259
Filename :
565259
Link To Document :
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