DocumentCode :
3053130
Title :
Full 3D string-level simulation of NAND flash device
Author :
Kwon, U.-H. ; Nakamura, M. ; Ohkura, Y. ; Ishikawa, H. ; Ohji, Y.
Author_Institution :
Semicond. Leading Edge Technol., Inc., Tsukuba
fYear :
2008
fDate :
9-11 Sept. 2008
Firstpage :
37
Lastpage :
40
Abstract :
We present results of full 3D sting-level process and device simulation for a typical 60nm NAND flash device, whose read/program/erase characteristics are successfully simulated using the quasi-steady state simulation method. Self boosting and local-self boosting phenomena are also successfully simulated in string-level applying realistic pulse waves to the entire wordlines and string select line in a fully transient manner. The comparison between the simulation results and the experiments in various bias conditions shows the capability of our simulation methodology for the design optimization of NAND flash device in string level.
Keywords :
NAND circuits; circuit simulation; flash memories; 3D string-level simulation; NAND flash device; self boosting phenomena; string select line; Boosting; Circuit simulation; Convergence; Design optimization; Doping; Electrodes; Mesh generation; Radiative recombination; Tunneling; Voltage; NAND flash device; TCAD; device simulation; local-self boosting; process simulation; self boosting;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location :
Hakone
Print_ISBN :
978-1-4244-1753-7
Type :
conf
DOI :
10.1109/SISPAD.2008.4648231
Filename :
4648231
Link To Document :
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