DocumentCode :
3053546
Title :
Consistent higher-order transport models for SOI MOSFETs
Author :
Vasicek, Martin ; Cervenka, Johann ; Karner, Markus ; Grasser, Tibor
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Wien
fYear :
2008
fDate :
9-11 Sept. 2008
Firstpage :
129
Lastpage :
132
Abstract :
We have developed a two-dimensional non-parabolic macroscopic transport model up to the sixth order. To model higher-order transport parameters with as few simplifying assumptions as possible, we apply an extraction technique from Subband Monte Carlo simulations followed by an interpolation within these Monte Carlo tables through the whole inversion layer. The impact of surface-roughness scattering as well as quantization on the transport parameters is inherently considered in the Subband Monte Carlo data. These tables are used to model higher-order mobilities as well as the macroscopic relaxation times as a function of the effective field and the carrier temperature. We have studied the influence of the inversion layer concentration on higher-order transport parameters within high fields and show the behavior of these parameters in a quantized system of a UTB SOI MOSFET.
Keywords :
MOSFET; Monte Carlo methods; carrier mobility; silicon-on-insulator; surface roughness; 2D nonparabolic macroscopic transport model; Monte Carlo simulation; SOI MOSFET; higher-order mobility; higher-order transport model; inversion layer concentration; surface-roughness scattering; transport parameter quantization; Distribution functions; Laboratories; MOSFETs; Microelectronics; Microscopy; Monte Carlo methods; Quantization; Rough surfaces; Scattering; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location :
Hakone
Print_ISBN :
978-1-4244-1753-7
Type :
conf
DOI :
10.1109/SISPAD.2008.4648254
Filename :
4648254
Link To Document :
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