• DocumentCode
    3053955
  • Title

    Numerical modeling and design of single photon counter 4H-SiC avalanche photodiodes

  • Author

    Akturk, A. ; Goldsman, N. ; Aslam, Sana ; Sigwarth, J. ; Herrero, F.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Maryland, College Park, MD
  • fYear
    2008
  • fDate
    9-11 Sept. 2008
  • Firstpage
    201
  • Lastpage
    204
  • Abstract
    We report device performance investigation of 4H-SiC avalanche photodiodes (APDs) with or without absorbing AlGaN cap layers, as 4H-SiCspsila potential use in single photon counter APDs have drawn interest. Wide bandgap 4H-SiC photodiodes have low dark current levels at high temperatures and under intense radiation compared to silicon, and the 4H-SiC APDs are ldquosolar blindrdquo - transparent to the sunpsilas visible spectrum. Additionally, they offer avalanche multiplications approaching a million, making single photon count possible. However, design and optimization of single photon counter APDs require a thorough understanding of impact ionization and optical absorption at the material level, and steady-state and transient APD operation at the device level. Here we address both of these levels.
  • Keywords
    III-V semiconductors; aluminium compounds; avalanche photodiodes; gallium compounds; impact ionisation; photon counting; semiconductor process modelling; silicon compounds; wide band gap semiconductors; AlGaN-SiC; cap layers; dark current levels; device performance; impact ionization; optical absorption; single photon counter avalanche photodiodes; solar blind; sun visible spectrum; wide bandgap photodiodes; Aluminum gallium nitride; Avalanche photodiodes; Counting circuits; Dark current; Numerical models; Optical design; Photonic band gap; Radiation detectors; Silicon; Temperature; 4H-silicon carbide multiplication layer; aluminum gallium nitride absorption layer; avalanche photodiode; single photon counter;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
  • Conference_Location
    Hakone
  • Print_ISBN
    978-1-4244-1753-7
  • Type

    conf

  • DOI
    10.1109/SISPAD.2008.4648272
  • Filename
    4648272