Title :
Reduction of discrete-dopant-induced high-frequency characteristic fluctuations in nanoscale CMOS circuit
Author :
Li, Yiming ; Hwang, Chih-Hong ; Yeh, Ta-Ching ; Huang, Hsuan-Ming ; Li, Tien-Yeh ; Cheng, Hui-Wen
Author_Institution :
Dept. of Commun. Eng., Nat. Chiao Tung Univ., Hsinchu
Abstract :
As the dimension of semiconductor device shrunk into nanoscale, characteristic fluctuation is more pronounced, and become crucial for circuit design. Diverse approaches have been reported to investigate and suppress the random-dopant-induced fluctuations in devices. However, attention is seldom drawn to the existence of high-frequency characteristic fluctuations of active device. In this paper, intrinsic high-frequency characteristic fluctuations of the nanoscale MOSFET circuit induced by random dopants are intensively explored using an experimentally validated simulation methodology, where fluctuation suppression technique is further examined. The circuit gain, the 3 db bandwidth and the unity-gain bandwidth of the tested circuit are estimated concurrently capturing the discrete-dopant-number-and discrete-dopant-position-induced fluctuations. This study provides an insight into discrete-dopant-induced intrinsic high-frequency characteristic fluctuations and examines the potential fluctuation suppression technique for nanoscale transistor circuit.
Keywords :
CMOS integrated circuits; MOSFET circuits; fluctuations; nanotechnology; network synthesis; transistor circuits; circuit design; discrete-dopant-induced high-frequency characteristic fluctuations; fluctuation suppression; nanoscale CMOS circuit; nanoscale MOSFET circuit; nanoscale transistor circuit; random-dopant-induced fluctuations; Bandwidth; Circuit simulation; Circuit synthesis; Circuit testing; Computational modeling; Doping profiles; Fluctuations; MOSFET circuits; Nanoscale devices; Semiconductor process modeling; Fluctuation; High Frequency Property; Modeling; Nanoscale MOSFETs; Random dopant; Simulation; Suppression;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location :
Hakone
Print_ISBN :
978-1-4244-1753-7
DOI :
10.1109/SISPAD.2008.4648274