DocumentCode
3054145
Title
Amorphous Si waveguides with high-quality stacked gratings for multi-layer Si optical circuits
Author
Endo, T. ; Saiki, Koji ; Hiidome, Keita ; Tokushige, Hiroki ; Katsuyama, Tomokazu ; Takagi, Hiroyuki ; Morita, Minoru ; Ito, Yu ; Tsutsui, K. ; Wada, Yasuhiro ; Ikeda, N. ; Sugimoto, Yoshiki
Author_Institution
Univ. of Fukui, Fukui, Japan
fYear
2013
fDate
June 30 2013-July 4 2013
Firstpage
1
Lastpage
2
Abstract
Amorphous Si wire waveguides with stacked gratings are successfully fabricated by carefully controlling the SOG coating thickness. The peak energy of the light from the waveguide is controlled to be just 1.55 μm as designed.
Keywords
amorphous semiconductors; diffraction gratings; elemental semiconductors; integrated optics; optical fabrication; optical waveguides; silicon; SOG coating thickness; amorphous waveguides; high-quality stacked gratings; multi-layer optical circuits; size 1.55 mum; Gratings; Optical device fabrication; Optical waveguides; Silicon; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
Conference_Location
Kyoto
Type
conf
DOI
10.1109/CLEOPR.2013.6599992
Filename
6599992
Link To Document