Title :
Three-dimensional topography simulation using advanced level set and ray tracing methods
Author :
Ertl, Otmar ; Selberherr, Siegfried
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Wien
Abstract :
We present new techniques for three-dimensional topography simulation of processes for which ballistic transport can be assumed at feature-scale. The combination of algorithms and data structures lent from the area of computer graphics allows a fast and memory saving solution of various deposition and etching processes.
Keywords :
computer graphics; ray tracing; 3D topography simulation; advanced level set; ballistic transport; computer graphics; data structures; deposition processes; etching processes; ray tracing methods; Computational efficiency; Computational modeling; Data structures; Encoding; Geometry; Level set; Microelectronics; Narrowband; Ray tracing; Surface topography;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location :
Hakone
Print_ISBN :
978-1-4244-1753-7
DOI :
10.1109/SISPAD.2008.4648303
