Title :
2D/3D NEGF modeling of the impact of random dopants /dopant aggregation in silicon nano-transistors
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Glasgow, Glasgow
Abstract :
The discrete nature of dopants becomes apparent in nano-scaled devices leading to microvariability problems which cause large fluctuations in the performance of macroscopically identical devices. Since self-averaging fails, the approach reviewed here utilises self-consistent non-equilibrium Green function modelling to evaluate the effects of discrete random dopants in source and drain non-perturbatively.
Keywords :
nanotechnology; semiconductor doping; transistors; dopant aggregation; nonequilibrium Green function; random dopants; silicon nanotransistors; Doping; Green function; Impurities; Nanoscale devices; Poisson equations; Quantum computing; Resonance; Semiconductor process modeling; Silicon; Threshold voltage; Green functions; impurities; nanotransistors; random dopants; resonances; resonant tunnelling;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location :
Hakone
Print_ISBN :
978-1-4244-1753-7
DOI :
10.1109/SISPAD.2008.4648306