Title :
Nanotube/nanorods fabrication of ZnO using atomic layer deposition and the template replication method
Author :
Gu, D. ; Tapily, K. ; Shrestha, P. ; Baumgart, H.
Author_Institution :
Appl. Res. Center, Old Dominion Univ., Newport News, VA, USA
Abstract :
In this study, ZnO thin films were deposited by ALD at low temperature using diethyl zinc (DEZn) and water precursors and were characterized by various techniques. ZnO tubes and rods were obtained using ALD and template replication method.
Keywords :
II-VI semiconductors; atomic layer deposition; nanofabrication; nanorods; replica techniques; semiconductor growth; semiconductor nanotubes; semiconductor thin films; zinc compounds; ALD; ZnO; atomic layer deposition; diethyl zinc; nanorods; nanotube; replication; semiconductor thin films; template replication method; Annealing; Atomic layer deposition; Fabrication; Grain size; Rough surfaces; Surface fitting; Surface morphology; Surface roughness; Temperature; Zinc oxide;
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
DOI :
10.1109/ISDRS.2009.5378084
