DocumentCode :
3056666
Title :
Semiconductor-dielectric interfacial study using spectral-spatial photocurrent probes and 1/f noise probe in organic field effect transistors
Author :
Jia, Zhang ; Meri, Inanc ; Shepard, Kenneth ; Kymissis, Ioannis
Author_Institution :
Columbia Univ. in the City of New York, New York, NY, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
1
Abstract :
Organic field effect transistors (OFETs) are sensitive to the chemistry of the gate dielectric/semiconductor boundary both during and after fabrication. In particular, surface states can be introduced on polymer gate dielectrics that shift the threshold voltage if the dielectric layer is exposed to oxidizing agents prior to semiconductor deposition. To understand the interfacial properties can not only benefit practical applications but also further the understanding of transport mechanism in OFETs.
Keywords :
1/f noise; coating techniques; dielectric properties; organic field effect transistors; photoconductivity; 1/f noise probe; fabrication; gate dielectric/semiconductor boundary; organic field effect transistors; polymer gate dielectrics; semiconductor deposition; semiconductor-dielectric interfacial study; spectral-spatial photocurrent probes; Chemistry; Dielectrics; Fabrication; Mechanical factors; OFETs; Photoconductivity; Polymers; Probes; Semiconductor device noise; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378133
Filename :
5378133
Link To Document :
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