• DocumentCode
    3056996
  • Title

    Effect of random surface charge distribution on transport in 4H-SiC MOSFETs

  • Author

    Potbhare, Siddharth ; Goldsman, Neil ; Akturk, Akin ; Lelis, Aivars

  • Author_Institution
    Electr. & Comput. Eng., Univ. of Maryland, College Park, MD, USA
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The study of random fluctuation of surface charges in 4H-SiC MOSFETs indicates that the surface charge variation gives rise to a shift in threshold voltage of the device. A small change in transconductance is observed when large amount of randomness is considered at the surface. Furthermore, the surface mobility changes significantly along the channel at low gate biases. But at high gate biases, the relative randomness in the surface mobility is greatly reduced leading to almost no change in the transconductance and current at high gate biases in 4H-SiC MOSFETs.
  • Keywords
    MOSFET; carrier mobility; fluctuations; silicon compounds; wide band gap semiconductors; 4H-SiC MOSFET; SiC; low gate biases; random fluctuation; random surface charge distribution; surface mobility; threshold voltage; transconductance; Educational institutions; Fluctuations; MOSFETs; Photonic band gap; Rough surfaces; Scattering; Silicon carbide; Surface roughness; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378149
  • Filename
    5378149