DocumentCode :
3056996
Title :
Effect of random surface charge distribution on transport in 4H-SiC MOSFETs
Author :
Potbhare, Siddharth ; Goldsman, Neil ; Akturk, Akin ; Lelis, Aivars
Author_Institution :
Electr. & Comput. Eng., Univ. of Maryland, College Park, MD, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
The study of random fluctuation of surface charges in 4H-SiC MOSFETs indicates that the surface charge variation gives rise to a shift in threshold voltage of the device. A small change in transconductance is observed when large amount of randomness is considered at the surface. Furthermore, the surface mobility changes significantly along the channel at low gate biases. But at high gate biases, the relative randomness in the surface mobility is greatly reduced leading to almost no change in the transconductance and current at high gate biases in 4H-SiC MOSFETs.
Keywords :
MOSFET; carrier mobility; fluctuations; silicon compounds; wide band gap semiconductors; 4H-SiC MOSFET; SiC; low gate biases; random fluctuation; random surface charge distribution; surface mobility; threshold voltage; transconductance; Educational institutions; Fluctuations; MOSFETs; Photonic band gap; Rough surfaces; Scattering; Silicon carbide; Surface roughness; Threshold voltage; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378149
Filename :
5378149
Link To Document :
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