Title :
A compact SR beamline for fabrication of high aspect ratio MEMS microparts
Author :
Sugiyama, S. ; Zhang, Y. ; Ueno, H. ; Hosaka, M. ; Fujimoto, T. ; Maeda, R. ; Tanaka, T.
Author_Institution :
Dept. of Mech. Eng., Ritsumeikan Univ., Kyoto, Japan
Abstract :
Taking advantage of the small synchrotron radiation (SR) equipment “AURORA” at Ritsumeikan University, we developed a compact beamline, which has a distance of about 3 meters between the SR source and exposure stages, to carry out deep X-ray lithography for fabrication of high aspect ratio MEMS microparts. Since the beamline is compact, a relatively high photon density can be achieved with the very small SR equipment so 1000 μm-high microstructures with an aspect ratio of 10 in an area of 15 mm×30 mm of the PMMA resist could be produced with 160 minutes exposure, 200 μm-high microstructures with an aspect ratio 10 were fabricated in a PMMA resist sheet and then used as a template for nickel electroforming, in order to further fabricate the high aspect ratio MEMS microparts in other materials, a large-area (4-inch) exposure can also be carried out by scanning X-Y stages controlled by a personal computer
Keywords :
X-ray apparatus; X-ray lithography; electroforming; micromachining; micromechanical devices; synchrotron radiation; 200 to 1000 micron; 3 m; 4 in; AURORA; Ni; Ni electroforming; PMMA resist; X-ray beamline; compact SR beamline; deep X-ray lithography; fabrication; high aspect ratio MEMS microparts; large-area exposure; microstructures; scanning X-Y stages; synchrotron radiation equipment; Fabrication; Micromechanical devices; Microstructure; Nickel; Optical control; Resists; Sheet materials; Strontium; Synchrotron radiation; X-ray lithography;
Conference_Titel :
Micro Machine and Human Science, 1996., Proceedings of the Seventh International Symposium
Conference_Location :
Nagoya
Print_ISBN :
0-7803-3596-1
DOI :
10.1109/MHS.1996.563405
