Title :
An electrostatic quality factor control for surface-micromachined lateral resonators
Author :
Lee, Ki Bang ; Cho, Young-Ho
Author_Institution :
Dept. of Mech. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
Abstract :
We present and apply a quality factor control method for laterally driven micromechanical resonant microstructures. The present method modifies the thickness of air-damping gap by applying an electrostatic force between the planar resonant microstructure and ground plane; thereby adjusting the quality factor of the microresonators after fabrication. Polysilicon resonators have been designed and fabricated by a 4-mask surface-micromachining process. The present method reduces the quality factor of the fabricated resonator at the rate of 120/V by applying the electrostatic voltage in the range of 1.75~2.25 V. The maximum 50% reduction of the quality factor has been achieved at the electrostatic voltage of 2.25 V
Keywords :
Q-factor; electrostatic devices; elemental semiconductors; masks; micromachining; micromechanical resonators; silicon; 1.75 to 2.25 V; Si; air-damping gap; electrostatic force; electrostatic quality factor control; electrostatic voltage; four-mask surface-micromachining process; laterally driven micromechanical resonant microstructures; polysilicon resonators; quality factor; surface-micromachined lateral resonators; Damping; Electrostatic analysis; Fabrication; Microcavities; Micromechanical devices; Microstructure; Q factor; Resonance; Temperature sensors; Voltage control;
Conference_Titel :
Micro Machine and Human Science, 1996., Proceedings of the Seventh International Symposium
Conference_Location :
Nagoya
Print_ISBN :
0-7803-3596-1
DOI :
10.1109/MHS.1996.563415