DocumentCode :
3059282
Title :
Zero-bias Si backward diodes detectors incorporating P and B δ-doping layers grown by chemical vapor deposition
Author :
Park, Si-Young ; Anisha, R. ; Jiang, Sheng ; Berger, Paul R. ; Loo, Roger ; Nguyen, Ngoc Duy ; Takeuchi, Shotaro ; Goossens, Jozefien ; Caymax, Matty
Author_Institution :
Dept. of Electr. & Comput. Eng., Ohio State Univ., Columbus, OH, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
For the first time, CVD-grown Si only backward diode detectors incorporating δ-doping planes were demonstrated. The best performance of curvature coefficient of 16 V-1 with a junction resistance of 14 kΩ was shown. By the successful technology transfer from LT-MBE to CVD, the eventual placement of optimized CVD-grown detectors monolithically integrated with 300 mm CMOS platform to fabricate large area focal plane arrays with low cost is now possible.
Keywords :
chemical vapour deposition; focal planes; molecular beam epitaxial growth; semiconductor diodes; semiconductor doping; silicon; CMOS platform; CVD; LT-MBE; backward diodes detectors; chemical vapor deposition; curvature coefficient; doping layers; large area focal plane arrays; resistance 14 kohm; zero-bias; Chemical vapor deposition; Educational institutions; Envelope detectors; Heterojunction bipolar transistors; Microwave devices; Millimeter wave technology; Semiconductor diodes; Silicon; Temperature sensors; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378255
Filename :
5378255
Link To Document :
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