DocumentCode :
3059457
Title :
Subband parameters in strained (110) silicon films from the Hensel-Hasegawa-Nakayama model of the conduction band
Author :
Sverdlov, Viktor ; Baumgartner, Oskar ; Selberherr, Siegfried
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
In this work we demonstrate that the HHN model allows to accurately describe the dependences of the subband energies and effective masses in (-110) thin silicon films. In order to do so, we appropriately rotate the HHN Hamiltonian for each pair of the valleys and resolve the subband structure numerically. The zero boundary conditions for the wave functions at the interfaces are applied.
Keywords :
MOSFET; conduction bands; semiconductor thin films; Hensel-Hasegawa-Nakayama model; conduction band; strained silicon films; subband parameters; Capacitive sensors; Conductive films; Educational institutions; Effective mass; FinFETs; MOSFETs; Quantization; Semiconductor films; Silicon; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378263
Filename :
5378263
Link To Document :
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