• DocumentCode
    3060920
  • Title

    Fermi level depinning of Ge Schottky contacts using single crystalline MgO

  • Author

    Zhou, Yi ; Han, Wei ; Wang, Yong ; Xiu, Faxian ; Zou, Jin ; Kawakami, R.K. ; Wang, K.L.

  • Author_Institution
    Electr. Eng. Dept., Univ. of California at Los Angeles, Los Angeles, CA, USA
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The authors investigated the origin of FL pinning in Ge Schottky junctions by characterizing the Fe/MgO/n-Ge junctions with single-crystalline and atomically smooth MgO epitaxially grown on Ge. The weak dependence of the SBH on the MgO thickness suggests that the surface states due to native defects on the Ge surface are likely to play the dominant role in the FL pinning. Further evidence is given by the fact that passivating the surface dangling bonds with aqueous (NH4)2S solution depins the FL more effectively than inserting the MgO films, which would have been the opposite if MIGS were to play the dominant role.
  • Keywords
    Fermi level; II-VI semiconductors; Schottky barriers; epitaxial growth; germanium; magnesium compounds; surface states; wide band gap semiconductors; (NH4)2S; Fe-MgO-Ge; Fermi level depinning; Ge Schottky contacts; Ge Schottky junctions; Schottky barrier height; epitaxial growth; metal induced gap states; single crystalline MgO; surface dangling bonds; surface states; Atomic force microscopy; Crystallization; Displays; Electrons; Insulation; Iron; Schottky barriers; Surface morphology; Surface treatment; Wave functions;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378328
  • Filename
    5378328