Title :
Realization of integrated narrow bandpass filters in the infrared region
Author :
Wang, Shao-Wei ; Liu, Dingquan ; Bin Lin ; Chen, Xiaoshuang ; Li, Zhifeng ; Shi, Yan ; Wang, Wei ; Lu, Wei
Author_Institution :
Shanghai Inst. of Tech. Phys., Chinese Acad. of Sci., China
fDate :
27 Sept.-1 Oct. 2004
Abstract :
We demonstrated a high-efficiency technique for the integration of narrow bandpass filters (NBPFs). A filter array integrated with 16 filters on a single substrate has been fabricated by twice depositing processes. The bandpass of the filters can be tuned widely and range from 2.295 to 2.967 μm in this case. The relative full width at half maximum (FWHM) δλ/λ of each filter is less than 0.7%. And the intensity of the bandpass is up to 41.3%.
Keywords :
band-pass filters; cavity resonator filters; electron beam deposition; etching; infrared spectra; optical filters; 2.295 to 2.967 micron; FWHM; Si; cavity resonator filters; electron beam deposition; etching; filter array fabrication; full width at half maximum; high efficiency technique; infrared region; integrated narrow bandpass filters; silicon substrate; tuning; Band pass filters; Etching; Filter bank; Optical arrays; Optical films; Optical filters; Optical refraction; Optical resonators; Optical variables control; Physics;
Conference_Titel :
Infrared and Millimeter Waves, 2004 and 12th International Conference on Terahertz Electronics, 2004. Conference Digest of the 2004 Joint 29th International Conference on
Print_ISBN :
0-7803-8490-3
DOI :
10.1109/ICIMW.2004.1422279
